Film Thickness Measurement Device "LF-1000"
Film thickness measurement device capable of measuring film thickness on wafer glass substrates and mirror substrates.
The "LF-1000" is a non-contact automatic film thickness measurement device equipped with a spectrometer and optical interference film thickness analysis software, enabling film thickness measurement by setting various parameters. This analysis software allows for non-contact automatic measurement and mapping of the thickness, refractive index, and absorption coefficient of transparent or translucent thin films by analyzing the interference waveforms from the surface of the thin film and the interface with the substrate. 【Features】 - Capable of measuring film thickness not only on wafers and glass substrates but also on other mirror-like substrates. - Various film thickness measurements can be performed by setting the optical constants of the film. - Excellent for measuring thin film oxide layers, SOI, EG films, color filters, etc. - Comes with an auto stage compatible with standard 3, 4, 5, 6, 8, and 12-inch wafers. - Loader specifications can also be accommodated as an option (consultation available for cassette/FOUP and number of ports). - Capable of measuring film thickness from thin films to thick films depending on the measurement head specifications. - GEM communication is optional. *For more details, please refer to the PDF materials or feel free to contact us.
- Company：ラポールシステム
- Price：Other
